Servo control system, lithographic apparatus and control method.

专利摘要:

公开号:NL1036028A1
申请号:NL1036028
申请日:2008-10-07
公开日:2009-04-15
发明作者:Youssef Karel Maria De Vos；Dirk-Jan Bijvoet；Ronald Casper Kunst；Ramidin Izair Kamidi；Khalid Manssouri
申请人:Asml Netherlands Bv；
IPC主号:

专利说明:

SERVO CONTROL SYSTEM, LITHOGRAPHIC EQUIPMENT AND CONTROL
METHOD
BACKGROUND
Field of the Invention
The present invention relates to a servo control system, a lithographic apparatus including a servo control system and a method for controlling the position of an object.
Description of the Related Art A lithographic apparatus is a machine that applies a desired pattern onto a substrate, usually onto a target portion of the substrate. A lithographic apparatus can be used, for example, in the manufacture of integrated circuits (ICs). In such a case, a patterning device, which is alternatively referred to as a mask or a reticle, may be used to generate a circuit pattern to be formed on an individual layer of the IC. This pattern can be transferred onto a target portion (e.g., including part of, one, or several dies) on a substrate (e.g., a silicon wafer). Transfer of the pattern is typically via imaging onto a layer of radiation-sensitive material (resist) provided on the substrate. In general, a single substrate will contain a network of adjacent target portions that are successively patterned. Conventional lithographic apparatus include so-called steppers, in which each target portion is irradiated by exposing an entire pattern onto the target portion at once, and so-called scanners, in which each target portion is irradiated by scanning the pattern through a radiation beam in a given direction (the "scanning" direction) while synchronously scanning the substrate parallel or anti-parallel to this direction. It is also possible to transfer the pattern from the patterning device to the substrate by imprinting the pattern onto the substrate.
In an embodiment of the scanner-type lithographic apparatus, the patterning device is supported by a patterning device support, which is movable in at least one scanning direction to move the patterning device through the radiation beam. The movement if the patterning device has been carried out with high accuracy to avoid overlay errors while at the same time the acceleration of the movable object
To control the positioning of the patterning device support with high accuracy, a servo control system is provided. The servo control system comprises a measurement system to measure the current position of the patterning device support. This actual position which may be measured in one or more directions / degrees of freedom, is subtracted from a set-point position of the patterning device support. The resulting error signal, i.e. the difference between the current position of the patterning device support and the desired position of the patterning device support is fed into a controller unit which provides a control signal. The control signal is fed into an actuator which actuator is configured to support the patterning device.
In this known servo control system, it is assumed that during movement of the patterning device support, the patterning device will not move with respect to the patterning device support. However, it has been shown that with increasing accelerations of the patterning device support, there may occur slip between the patterning device support and the patterning device itself. As a result the positioning of the patterning device may be correctly positioned as a patterning device, when this patterning device is positioned in a nominal position, i.e. the assumed or initial position of the patterning device with respect to the patterning device support. However, when slip occurred between the patterning device and the patterning device support, the patterning device may not be correctly positioned with respect to the projection system although the patterning device is correctly positioned with respect to the projection system. Furthermore, the slip which will occur with a certain acceleration is not constant. Therefore, it is hard to predict the slip between object and the movable support which will be obtained with a certain acceleration / movement of the movable support.
SUMMARY
It is desirable to provide a lithographic apparatus with a movable support for supporting an object, the accuracy of the positioning or said object is less susceptible for slip between the movable support and the object. Further, it is desirable to provide a servo control system which makes positioning of an object supported by a movable support less susceptible for slip between the object and the movable support.
According to an aspect of the invention, there is provided a servo control system to control a position or an object supported by a movable support, including: - a first measurement system configured to measure a position or said movable support, - a comparative device configured to provide an error signal on the basis of comparison between a measured movable support position and a desired movable support position, - a controller unit to provide a control signal on the basis of said error signal, and - an actuator configured to actuate said movable support on the basis of said control signal, said said servo control system further comprises a slip compensation device for compensation or slip between said object and said movable support, said slip compensation device including a second measurement system to measure a object position with respect to said movable support, and an additional device to add a slip compensation signal to said measured movable support position or said error signal on the basis or said measured object position.
According to an aspect of the invention there is provided a lithographic apparatus including: - an illumination system configured to condition a radiation beam; - a patterning device support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; - a substrate table constructed to hold a substrate; and - a projection system configured to project the patterned radiation beam onto a target portion of the substrate, said said lithographic apparatus comprises servo control system to control a position of an object supported by a movable support, including: - a first measurement system configured to measure a position of said movable support, - a comparative device configured to provide an error signal on the basis of comparison between a measured movable support position and a desired movable support position, - a controller unit to provide a control signal on the basis of said error signal, and - an actuator configured to actuate said movable support on the basis of said control signal, said said servo control system further comprises a slip compensation device for compensation or slip between said object and said movable support, said slip compensation device including a second measurement system to measure an object position with respect to said movable support, and an addi tion device to add a slip compensation signal to said measured movable support position or said error signal on the basis of said measured object position.
According to an aspect of the invention there is provided a method for controlling the position of an object supported by a movable support, including the steps of: - measuring a position or said movable support, - subtracting said measured movable support position from a desired movable support position to provide an error signal, - feeding said error signal to a control unit, said control unit providing a control signal on the basis of said error signal, and - feeding said control signal to an actuator configured to actuate said movable support, said method further comprises compensating slip between said object and said movable support, said compensating including the steps of - measuring an object position or said object with respect to said movable support, and - adding a slip compensation signal to said measured movable support position or said error signal on the basis or said measured object position.
LETTER DESCRIPTION OF THE DRAWINGS
Embodiments of the invention will now be described, by way of example only, with reference to the accompanying schematic drawings in which corresponding reference symbols indicate corresponding parts, and in which:
Figure 1 depicts a lithographic apparatus according to an embodiment of the invention;
Figures 2 and 2b depict a movable support supporting an object;
Figure 3 depicts a control scheme according to prior art;
Figure 4 depicts a control scheme according to the present invention;
Figure 5 depicts an alternative embodiment or a control scheme according to the invention; and
Figure 6 depicts an alternative embodiment or a movable support according to the invention.
DETAILED DESCRIPTION
Figure 1 schematically depicts a lithographic apparatus according to one embodiment of the invention. The apparatus includes an illumination system (illuminator) IL configured to condition a radiation beam B (eg UV radiation or any other suitable radiation), a mask support structure (eg a mask table) MT constructed to support a patterning device (eg a mask) MA and connected to a first positioning device PM configured to accurately position the patterning device in accordance with certain parameters. The apparatus also includes a substrate table (eg a wafer table) WT or "substrate support" constructed to hold a substrate (eg a resist-coated wafer) W and connected to a second positioning device PW configured to accurately position the substrate in accordance with certain parameters. The apparatus further includes a projection system (e.g. a refractive projection lens system) PS configured to project a pattern imparted to the radiation beam B by patterning device MA onto a target portion C (e.g. including one or more dies) or the substrate W.
The illumination system may include various types of optical components, such as refractive, reflective, magnetic, electromagnetic, electrostatic or other types of optical components, or any combination thereof, for directing, shaping, or controlling radiation.
The mask support structure supports, i.e. bears the weight of, the patterning device. It holds the patterning device in a manner that depends on the orientation of the patterning device, the design of the lithographic apparatus, and other conditions, such as for example whether or not the patterning device is a hero in a vacuum environment. The mask support structure can use mechanical, vacuum, electrostatic or other clamping techniques to hold the patterning device. The mask support structure may be a frame or a table, for example, which may be fixed or movable as required. The mask support structure may ensure that the patterning device is at a desired position, for example with respect to the projection system. Any use of the terms "reticle" or "mask" may be considered synonymous with the more general term "patterning device."
The term "patterning device" used should be broadly interpreted as referring to any device that can be used to impart a radiation beam with a pattern in its cross-section so as to create a pattern in a target portion of the substrate. It should be noted that the pattern imparted to the radiation beam may not exactly correspond to the desired pattern in the target portion of the substrate, for example if the pattern includes phase-shifting features or so called assist features. Generally, the pattern imparted to the radiation beam will correspond to a particular functional layer in a device being created in the target portion, such as an integrated circuit.
The patterning device may be transmissive or reflective. Examples of patterning devices include masks, programmable mirror arrays, and programmable LCD panels. Masks are well known in lithography, and include mask types such as binary, alternating phase shift, and attenuated phase shift, as well as various hybrid mask types. An example of a programmable mirror array employs a matrix arrangement of small mirrors, each of which can be individually tilted so as to reflect an incoming radiation beam in different directions. The tilted mirrors impart a pattern in a radiation beam which is reflected by the mirror matrix.
The term "projection system" used should be broadly interpreted as encompassing any type of projection system, including refractive, reflective, catadioptric, magnetic, electromagnetic and electrostatic optical systems, or any combination thereof, as appropriate for the exposure radiation being used, or for other factors such as the use of an immersion liquid or the use of a vacuum. Any use of the term "projection lens" may also be considered as synonymous with the more general term "projection system".
As here depicted, the apparatus is of a transmissive type (e.g., employing a transmissive mask). Alternatively, the apparatus may be of a reflective type (e.g., employing a programmable mirror array or a type referred to above, or employing a reflective mask).
The lithographic apparatus may be of a type having two (dual stage) or more substrate tables or "substrate supports" (and / or two or more mask tables or "mask supports"). In such "multiple stage" machines the additional tables or supports may be used in parallel, or preparatory steps may be carried out on one or more tables or supports while one or more other tables or supports are being used for exposure.
The lithographic apparatus may also be a type of at least a portion of the substrate may be covered by a liquid having a relatively high refractive index, e.g., water, so as to fill a space between the projection system and the substrate. Liquid immersion may also be applied to other spaces in the lithographic apparatus, for example, between the mask and the projection system. Immersion techniques can be used to increase the numerical aperture of projection systems. The term "immersion" as used does not mean that a structure, such as a substrate, must be submerged in liquid, but rather only means that a liquid is located between the projection system and the substrate during exposure.
Referring to figure 1, the illuminator IL receives a radiation beam from a radiation source SO. The source and the lithographic apparatus may be separate entities, for example when the source is an excimer laser. In such cases, the source is not considered to be part of the lithographic apparatus and the radiation beam is passed from the source SO to the illuminator IL with the aid of a beam delivery system BD including, for example, suitable directing mirrors and / or a beam expander. In other cases the source may be an integral part of the lithographic apparatus, for example when the source is a mercury lamp. The source SO and the illuminator IL, together with the beam delivery system BD if required, may be referred to as a radiation system.
The illuminator IL may include an adjuster AD configured to adjust the angular intensity distribution of the radiation beam. Generally, at least the outer and / or inner radial extent (commonly referred to as σ-outer and σ-inner, respectively) or the intensity distribution in a pupil plane or the illuminator can be adjusted. In addition, the illuminator IL may include various other components, such as an integrator IN and a condenser CO. The illuminator may be used to condition the radiation beam, to have a desired uniformity and intensity distribution in its cross-section.
The radiation beam B is an incident on the patterning device (e.g., mask MA), which is a hero on the mask support structure (e.g., mask table MT), and is patterned by the patterning device. Having traversed the mask MA, the radiation beam B passes through the projection system PS, which is the beam onto a target portion C or the substrate W. With the aid of the second positioning device PW and position sensor IF (eg an interferometric device, linear encoder or capacitive sensor), the substrate table WT can be moved accurately, eg so as to position different target portions C in the path of the radiation beam B. Similarly, the first positioning device PM and another position sensor (which is not explicitly depicted in Figure 1) can be used to accurately position the mask MA with respect to the path of the radiation beam B, eg after mechanical retrieval from a mask library, or during a scan. In general, movement of the mask table MT may be realized with the aid of a long-stroke module (coarse positioning) and a short-stroke module (fine positioning), which form part of the first positioning device PM. Similarly, movement of the substrate table WT or "substrate support" may be realized using a long-stroke module and a short-stroke module, which form part of the second positioner PW. In the case of a stepper (as opposed to a scanner) the mask table MT may be connected to a short-stroke actuator only, or may be fixed. Mask MA and substrate May be aligned using mask alignment marks M1, M2 and substrate alignment marks P1, P2. Although the substrate alignment marks as illustrated occupy dedicated target portions, they may be located in spaces between target portions (these are known as scribe-lane alignment marks). Similarly, in situations in which more than one that is provided on the mask MA, the mask alignment marks may be located between the dies.
The depicted apparatus could be used in at least one of the following modes: 1. In step mode, the mask table MT or "mask support" and the substrate table WT or "substrate support" are kept essentially stationary, while an entire pattern imparted to the radiation beam is projected onto a target portion C at one time (ie a single static exposure). The substrate table WT or "substrate support" is then shifted in the X and / or Y direction so that a different target portion can be exposed. In step mode, the maximum size of the exposure field limits the size of the target portion C imaged in a single static exposure. 2. In scan mode, the mask table MT or "mask support" and the substrate table WT or "substrate support" are scanned synchronously while a pattern is imparted to the radiation beam is projected onto a target portion C (ie a single dynamic exposure) . The velocity and direction of the substrate table WT or "substrate support" relative to the mask table MT or "mask support" may be determined by the (de-) magnification and image reversal characteristics of the projection system PS. In scan mode, the maximum size of the exposure field limits the width (in the non-scanning direction) or the target portion in a single dynamic exposure, whereas the length of the scanning motion has the height (in the scanning direction) of the target portion. 3. In another mode, the mask table MT or "mask support" is kept essentially stationary holding a programmable patterning device, and the substrate table WT or "substrate support" is moved or scanned while a pattern is projected onto the radiation beam a target portion C. In this mode, generally a pulsed radiation source is employed and the programmable patterning device is updated as required after each movement of the substrate table WT or "substrate support" or in between successive radiation pulses during a scan. This mode of operation can be readily applied to maskless lithography that utilizes programmable patterning device, such as a programmable mirror array or a type as referred to above.
Combinations and / or variations on the modes described above or use or entirely different modes or use may also be employed.
Figure 2a shows a top view of a movable support 1 and an object 2 supported by the movable support 1. For instance, the movable support 1 may be a patterning device support or substrate support and the object 2 a patterning device or a substrate, respectively . The movable support 1 is constructed to move in one or more directions with relatively high accelerations. The object 2 may be clamped on the movable support 1 by a clamping device, such as a vacuum, electrostatic, magnetic or electromagnetic clamping device (not shown).
In certain applications, in particular in lithographic apparatus, there is a continuously increasing demand on higher accuracy, in combination with higher throughput. To obtain a higher throughput, the accelerations or the movable support may be increased. However, the higher accelerations may require a higher clamping force to clamp the object 2 on the movable support 1. But even with high clamping force, it has been shown that for large accelerations, for instance above 10G (micro) slip between the object and the movable support may occur. Furthermore, a high clamping force on the object and, in particular mechanical parts, clamping or holding the object during acceleration may result in internal stresses and / or deformations of the movable object and are therefore undesirable. However, the avoidance of such mechanical parts increases the chance on the occurrence or slip between the object and the movable support.
In Figure 2a it is shown that the object is in the y-direction located at a nominal y-position with respect to the movable support 1. This is for instance the position in which the object is located or assumed to be located during loading of the object 2. This position will normally be used to determine the set-point values of the movable support 1 which will be used to control the position of the movable support 1 and therewith the position of the object 2 supported by the movable support 1 .
However, during acceleration in the y-direction as indicated with arrow A in Figure 2b, slip may occur in the opposite direction as for instance indicated by the arrow S. In figure 2b it is further shown that the movable object has moved from the nominal y position ynm to the y slip position ysip as a result of the slip between the object 2 and the movable support 1. The amount of slip, ie the difference between the y slip position ysip and the nominal position ynm cannot be predicted with high accuracy since this difference cannot be reproduced with high accuracy. It has been shown that the amount of slip which occurs between an object and movable support may vary even though the same accelerations are used.
Furthermore, it has been shown in the case of a patterning device support carrying a patterning device, the slip may be more than 100 nm at acceleration levels up to 15 G. Such slip levels may lead to imaging errors such as focus and / or overlay errors in a lithographic apparatus. A position measurement system to measure the position of the object with respect to respect for a substantial stationary frame is provided. The position measurement system for measuring the movable support of Figures 2a and 2b comprises two y-sensors 3, 4 and an x-sensor 5 to measure the position of the object support 1 in three coplanar degrees of freedom (x, y, Rz) . This position measurement system may be used to measure the position of the movable support. In practice, the position measurement system may be any type of system suitable for measuring the current position of the movable support, such as an interferometer measurement system or an encoder-type measurement system. The sensors of the system 3, 4 and 5 may be mounted on a frame or such, as shown in Figures 2a and 2b, but in alternative expired, the sensors may be mounted on the movable support and a sensor reference object such as mirror surfaces or encoder grids may be mounted on the frame.
An actuator 6 is provided to actuate the movable support to the desired position. This actuator 6 may be any suitable type or actuator configured to move the movable support with high precision in a desired direction. The actuator 6 may be configured to actuate the movable support in two or more degrees of freedom and / or two or more actuators may be provided to make movement in the required degrees of freedom possible. Such actuators are known in the art.
Now referring to Figure 3 a prior art control scheme for a movable support is shown. The control scheme shows a setpoint generator SG which is configured to generate a setpoint yst, for the servo control system. The setpoint ys is the desired position of the object 2 supported on the movable support 1. However, the position of the object is controlled by the actuation of the movable support 1, it is assumed that the object remains in the same position, for instance the nominal position ynm. In other words, it is assumed that no slip occurs between object and movable support.
The position of the movable support measured by the position measurement system yms is compared to a comparative device with the setpoint yst. The difference yerr, i.e. the error signal, between the setpoint yst and the current position of the movable support yms is fed into controller unit CU which may be any suitable type of controller, for instance a PI or PID controller. The controller unit CU provides on the basis of the error signal yOT a control signal yctr which is fed to the actuator of the movable support MS.
In an embodiment A feed-forward unit FF may be provided (indicated with dashed lines) to provide a feed-forward signal on the basis of a setpoint or setpoint-dependent signal such as acceleration yacc or snap ysnp or any other signal. The feed-forward signal is added to an additional device to the control signal yctI.
With the prior art control scheme the movable support is accurately positioned in a desired set-point. However, as explained above slip may occur between the movable support and the object supported by the movable support, in particular at high accelerations or the movable support. Due to slip the object may not remain in the initial position, for instance the nominal position ynm, with respect to the movable support. Thus even though the movable support is positioned in the desired position, i.e. the error signal yerr is zero, the object may not be positioned in the desired position, for instance misaligned with respect to another object. In a lithographic apparatus misalignment or a patterning device may lead to imaging errors such as overlay and / or focus errors.
In order to take the slip between the movable support 1 and the object 2 into account, a y-sensor 7 is provided on the movable support 1. The y-sensor 7 is configured to measure the position of the object 2 with respect to the movable support 1. Any type or suitable sensor may be used. A contactless sensor is preferred since contact between the sensor 7 and the object 1, may induce internal stresses and / or deformations in the object 2 during high accelerations. Such internal stresses and / or deformations may lead to misalignment of the object 2. For instance when the object is patterning device, the internal stresses and / or deformations may lead to focus and / or overlay errors. Suitable contactless sensors are for instance capacitive sensors. However, contact sensors may also be applied.
In the servo control system of the present invention the ysip distance as measured by the y-sensor 7 is tasks into account in order to compensate for the slip between the movable support 1 and the object 2.
Figure 4 is a control scheme according to the present invention. The control scheme of Figure 4 comprises a feedback loop in accordance with the prior art control scheme of Figure 3. The measured position of a moveable support MS is measured and compared to a comparative device with a set-point generated by a set-point generator SG. The difference between the signal is fed to the CU controller unit.
However, different than the prior art control scheme as shown in Figure 3, a second position measurement signal ysip is also fed back and added to the signals on the comparative device. Thus, the error signal comprises the setpoint ys, plus the ysip signal minus the yms signal.
In alternative variants, the ysip signal may not be added to the comparative device, but at another location using an additional device. For instance, the ysip signal may be added to the position signal yms measured by the movable support position measurement system, the setpoint yst or the error signal the error signal yerT.
By feeding back the position difference between the movable support 1 and the object 2, the movement of the object with respect to the movable support is tasks into account. As a result not the movable support 1, but the object 2 is correctly positioned when the error signal yeiT is zero. For instance in the example of a lithographic apparatus, the patterning device is correctly positioned with respect to the projection system instead of the patterning device support. As a result the overlay error which may result when slip occurs and the patterning device support is correctly positioned with respect to the projection system is prevented.
It is remarked that in alternative terms, the ysip signal may not be added to the comparative device, but at another location using an additional device. For instance, the ysip signal may be added to the position signal yms measured by the movable support position measurement system, the setpoint yst or the error signal the error signal yen-
In the feedback loop or the ysip a filter unit FU is provided to filter out high frequency disturbances. The filter unit FU is for instance a second order low pass filter.
Figure 5 shows another embodiment of a control scheme according to the invention. In this control scheme the yS | p signal, as measured by the sensor 7 is subtracted from the nominal position of the ynm object. The difference between the ysip signal and the ynm value is added to the setpoint signal, the yms signal or the yen · Signal. In this embodiment, the setpoint yst generated by the setpoint generator SG is based on the nominal position of the object. In the embodiment of Figure 4, the setpoint is based on the desired location of the sensor.
Figure 6 shows an alternative embodiment or a movable support 1 according to the invention. In the embodiment of Figures 2a and 2b, one y-sensor is provided to measure the change in position of the object with respect to the movable support due to slip. Such compensation is particularly useful when slip is only expected in the corresponding direction. When slip is expected in more than one direction, multiple sensors may be provided on the movable support to measure the position of the object 2 with respect to the movable support. In figure 6, three sensors are provided, two y-sensors 7, 8 and an x-sensor 9. With these sensors 7, 8 and 9 the movement of the object in three degrees of freedom (x, y, Rz) may be obtained. Each of these signals may be fed back to one or more actuators to move the movable support in such a way that the object is correctly positioned. In alternative variant more or less sensors may be provided for feedback or a compensation signal to take between a movable support and an object supported by such movable support into an account in more or less degrees of freedom.
Although specific reference may be made in this text to the use of lithographic apparatus in the manufacture of ICs, it should be understood that the lithographic apparatus described may have other applications, such as the manufacture of integrated optical systems, guidance and detection patterns for magnetic domain memories, flat-panel displays, liquid-crystal displays (LCDs), thin-film magnetic heads, etc. The skilled artisan will appreciate that, in the context of such alternative applications, any use of the terms "wafer" or " those "may be considered as synonymous with the more general terms" substrate "or" target portion ", respectively. The substrate referred to may be processed, before or after exposure, in for example a track (a tool that typically applies to a layer of resist to a substrate and develops the exposed resist), a metrology tool and / or an inspection tool. Where applicable, the disclosure may be applied to such and other substrate processing tools. Further, the substrate may be processed more than once, for example in order to create a multi-layer IC, so the term substrate used may also refer to a substrate that already contains multiple processed layers.
Although specific reference may have been made above to the use of the invention in the context of optical lithography, it will be appreciated that the invention may be used in other applications, for example imprint lithography, and where the context allows, is not limited to optical lithography. In imprint lithography a topography in a patterning device the pattern created on a substrate. The topography of the patterning device may be pressed into a layer or resist supplied to the substrate whereupon the resist is cured by applying electromagnetic radiation, heat, pressure or a combination thereof. The patterning device is moved out of the resist leaving a pattern in it after the resist is cured.
The terms "radiation" and "beam" used and compassed all types of electromagnetic radiation, including ultraviolet (UV) radiation (eg having a wavelength or about 365, 248, 193, 157 or 126 nm) and extreme ultra-violet (EUV radiation (eg having a wavelength in the range of 5-20 nm), as well as particle beams, such as ion beams or electron beams.
The term "lens", where the context allows, may refer to any one or combination of various types of optical components, including refractive, reflective, magnetic, electromagnetic and electrostatic optical components.
While specific expired or the invention have been described above, it will be appreciated that the invention may be practiced otherwise than as described. For example, the invention may take the form of a computer program containing one or more sequences of machine-readable instructions describing a method as disclosed above, or a data storage medium (eg semiconductor memory, magnetic or optical disk) having such a computer program stored therein.
The descriptions above are intended to be illustrative, not limiting. Other aspects of the invention are set out as in the following numbered clauses: 1. Servo control system to control a position or an object supported by a movable support, including: - a first measurement system configured to measure a position or said movable support, - a comparative device configured to provide an error signal on the basis of comparison between a measured movable support position and a desired movable support position, - a controller unit to provide a control signal on the basis of said error signal, and - an actuator configured to actuate said movable support on the basis of said control signal, said said servo control system further comprises a slip compensation device for compensation or slip between said object and said movable support, said slip compensation device including a second measurement system to measure a object position with respect to said movable support, and an additional device to add a slip compensation signal to said measured movable support position or said error signal on the basis of said measured object position. 2. The servo control system or clause 1, said said compensation signal is said measured object position. 3. The servo control system or clause 1, where said slip compensation signal is the difference between said measured object position and a nominal object position. 4. The servo control system or clause 1, said said servo control system comprises a filter unit to filter a signal representative for said position difference. 5. The servo control system or clause 1, said said filter unit comprises a second order low-pass filter. 6. The servo control system or clause 1, said second measurement system comprises at least one sensor mounted on said movable support. 7. The servo control system or clause 6, said at least one sensor is a capacitive sensor. 8. The servo control system or clause 6, said least one sensor is a contactless sensor. 9. The servo control system of clause 1, said second measurement system comprising a first position sensor and a second position sensor, said first and second position sensor being configured to measure said position difference in a first direction, said first and second sensor being spaced in a direction perpendicular to said first direction. 10. The servo control system or clause 9, said second measurement system comprises a third sensor to measure said position difference in a second direction perpendicular to said first direction. 11. A lithographic apparatus including: - an illumination system configured to condition a radiation beam; - a patterning device support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; - a substrate table constructed to hold a substrate; and - a projection system configured to project the patterned radiation beam onto a target portion of the substrate, said said lithographic apparatus comprises the servo control system of clause 1. 12. The lithographic apparatus of clause 11, said said object is said patterning device and said movable support is said patterning device support. 13. The lithographic apparatus of clause 11, said said object is said substrate and said movable support is said substrate table. 14. Method for controlling the position of an object supported by a movable support, including the steps of: - measuring a position or said movable support, - subtracting said measured movable support position from a desired movable support position to provide an error signal, - feeding said error signal to a control unit, said control unit providing a control signal on the basis of said error signal, and - feeding said control signal to an actuator configured to actuate said movable support, said said method further comprises compensating slip between said object and said movable support, said compensating including the steps of - measuring an object position or said object with respect to said movable support, and - adding a slip compensation signal to said measured movable support position or said error signal on the basis of said measured object position. 15. The method of clause 14, said object position is measured in two directions. 16. The method of clause 14, said said compensation signal is said measured object position. 17. The method of clause 14, said slip compensation signal is the difference between said measured object position and a nominal object position.
It will be apparent to one skilled in the art that modifications may be made to the invention as described without departing from the scope of the conclusion set out below.

权利要求:
Claims (1)
[1]
A servo control system for controlling a position of an object supported by a movable carrier, comprising: - a first measuring system adapted to measure a position of said movable carrier, - a comparator adapted to generate an error signal on the basis of of a comparison of a measured position of the carrier and a desired position of the carrier, - a control unit adapted to generate a control signal on the basis of said error signal, and - an actuator adapted to control the movable carrier on the basis of the control signal, wherein the servo control system is further provided with a slip compensation unit for compensating slip between said object and the movable carrier, said slip compensation unit being provided with a second measuring system for measuring a position of the object relative to the movable carrier, and an add-on unit for adding a slip compe signal to said measured position of the movable carrier or said error signal based on said measured position of the object.

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法律状态:
2009-06-02| AD1A| A request for search or an international type search has been filed|

优先权:

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申请号 | 申请日 | 专利标题

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US96064607P| true| 2007-10-09|2007-10-09|

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US96064607|2007-10-09|

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